Intel increases its chip production under 10nm SuperFIN node

Intel's problems in producing its processors have been talked about for quite some time. The company has had to outsource the production of certain processors to meet demand. Added to this is a delay of years for the launch of the 10nm lithograph. Intel now announces that it has greatly improved its wafer production capacity under the 10nm node.
The lag of the 10nm lithography would be due to a design that markedly increases density. The density of the 10nm is 2.5 times the density of transistors at the 14nm node. An increase in density that makes the design of the company's monolithic chips very difficult. Hence, the Alder Lake-S processors would already make use of a modular design.
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Intel Announces 10nm Chip Production Capacity Increase
The company indicates that the manufacturing problems would already be solved for this node. A node, on the other hand, that has been quite solid in the Tiger Lake-U processors intended for laptops.
A necessary capacity expansion taking into account the upcoming launches planned by the company. During Q1 2021, Tiger Lake-H processors for gaming laptops should be launched. By the end of 2021 we should see Alder Lake-S processors made at 10nm.
👉 Features of intel Tiger Lake-U processors 👈
In response to the incredible demand from customers, Intel has doubled its combined 14nm and 10nm manufacturing capacity in recent years. To do this, the company found innovative ways to deliver more performance within existing capacity through performance improvement projects and significant investments in capacity expansion. This video recounts that journey, which even included the reuse of existing space in laboratories and offices for manufacturing.
Intel statement
For this, the company has accelerated the adoption of the 10nm node. Currently, the Oregon and Arizon plants in the United States, as well as the Israel plant, have a fairly high chip production capacity at 10nm. Among others, it has been achieved thanks to 10nm SuperFIN technology, which offers the greatest improvement in a node in the Intel history. But it also offers performance improvements comparable to the transition of a full node.



