Intel announces that it has NAND Flash memories manufactured in the 10nm process, with a transistor density higher than expected, thus improving performance and consumption.
The most versatile products on the market and the easiest to manufacture are non-volatile memories, also known as NAND Flash memories. Many manufacturers test new manufacturing processes in this type of memory, as they are easy to manufacture and have a low cost. Intel has imitated this practice and has just announced that it has already manufactured the first 10nm NAND Flash chip, which means that in the end, the 10nm process is finished and operational and the last small problems of this process would have been solved. manufacturing.
Intel in the 10nm process has implemented FinFET Hyper Scaling technology, something that allows to increase the density of the transistors by 2.7x, with respect to the normal density expected in the 10nm manufacturing process. Thus, the 3-layer 64D NAND chip manufactured in 10nm by Intel will have a high density of transistors, in addition to all the benefits of this new manufacturing process, which provides an improvement in performance and energy efficiency. The first chips of these characteristics will go to SSD units destined for the professional segment, due to the high costs and little by little the manufacturing process will improve and the final price will lower.
So far we have talked about 10nm for Intel processors and the company is known for its processors, but actually they work and develop many more products and they are not only dedicated to processors. Examples of other technologies are the Thunderbolt port or Intel Optane drives. This is possibly the last announcement of the year by Intel, with the exception of the arrival of the Intel Coffee Lake processors on the market.
In particular I would be interested in increasing availability above density and consumption !!